Description
The ENI GHW-50 is a high-performance RF power generator designed to deliver stable, reliable RF energy for plasma processing systems.
It features precise power regulation, full remote control capability, and water-cooled operation for continuous industrial use.
Condition:
Excellent physical condition, fully tested and operational.
All connectors and controls are intact. Ready for integration into plasma systems.Applications include:
-
Semiconductor plasma etching
-
PECVD & PVD deposition
-
Ion cleaning and surface modification
-
Thin film research and plasma systems
| 参数项目 | 说明 |
|---|---|
| Model | ENI GHW-50 |
| Brand | ENI / MKS Instruments |
| Output Power | 5 kW（5000 W） |
| Frequency | 13.56 MHz |
| AC Input | 380–480 V ，21 A，50/60 Hz |
| Control | （Analog / Serial） |
| Cooling | （Water-cooled） |
| Interface | Analog I/O、RS232、Matchwork Interface、DC Bias、Interlock |
| Dimension | 483 × 177 × 560 mm（ 19″ ） |
| Weight | 60 kg |
| Made in | USA |
