User Guide for Hitachi Ion Sputter Coater MC1000/MC100 Series

1. Introduction and Instrument Overview

The Hitachi MC1000 Ion Sputter Coater is a benchtop magnetron sputtering coating device specifically designed by Hitachi High-Tech Corporation for the preparation of scanning electron microscope (SEM) samples. It is used to deposit extremely thin (1 – 30 nm) conductive metal films on the surfaces of non-conductive samples, eliminating the charging effect during SEM observation and improving the quality of secondary electron imaging.

Core Advantages:

• Utilizes magnetron sputtering technology to achieve low-temperature, low-damage, and high-particle-fineness coating.
• Particularly friendly to heat-sensitive, biological, polymer, and other sensitive samples.
• Features a 7-inch color LCD touch screen for operation and supports multiple languages.
• The Recipe function allows for the storage of multiple sets of commonly used parameters for one-click recall.
• Supports an optional film thickness monitoring unit for precise control of film thickness.
• Highly modern and automated operation.
• Applicable in fields such as materials science, biology, geology, semiconductors, nanotechnology, and failure analysis.

2. Safety Precautions

Argon Gas Safety:

• Ensure the operating environment is well-ventilated or install an oxygen concentration detector.

High-Voltage Electrical Risk:

• Never open the cover or touch internal components during operation.

Vacuum Safety:

• Always break the vacuum before opening the sample chamber.

Target Material Toxicity:

• Wear gloves and a mask when replacing target materials.

Radiation:

• A small amount of X-rays is generated during the sputtering process, but the equipment is shielded.

Prohibited Actions:

• Never use oxygen or other active gases.
• Do not place flammable, explosive, or strongly magnetic substances on the sample stage.
• Do not leave the equipment unattended during operation.

Emergency Situations:

• Immediately cut off the power supply, close the main argon gas valve, and evacuate personnel.

3. Technical Specifications

Item	Specification Details
Model	MC1000
Sputtering Method	DC magnetron sputtering
Target Size	φ50 mm × 0.5 mm
Sample Stage	Standard φ50 – 60 mm, rotatable; maximum sample height 20 mm
Target-Sample Distance	Fixed at 30 mm
Ultimate Vacuum	≤5×10⁻⁴ Pa
Working Vacuum	5 – 10 Pa
Sputtering Current	Adjustable from 0 – 40 mA
Sputtering Voltage	Adjustable from 0 – 1.5 kV
Coating Rate	Au: ~35 nm/min; Au/Pd: ~25 nm/min; Pt: ~15 nm/min; Pt/Pd: ~20 nm/min
Film Thickness Control	Time control or optional film thickness meter
Vacuum Pump	Turbo molecular pump + rotary mechanical pump
Operating Gas	High-purity argon (above 99.99%)
Gas Flow Control	Automatic mass flow controller (MFC)
Display/Operation	7-inch color LCD touch screen
Recipe Storage	Up to 5 – 10 sets
Power Supply	AC 100 – 240 V, 50/60 Hz, single-phase, approximately 1.5 kVA
Dimensions	Approximately 450 (W) × 391 (D) × 390 (H) mm
Weight	Main unit approximately 25 kg, pump set approximately 28 kg
Operating Environment	Temperature 15 – 30℃, humidity ≤85% (no condensation)

4. Instrument Structure and Panel Description

Front View:

• 7-inch touch screen
• Sample chamber glass cylinder
• Target height adjustment knob (present on some older models)
• Main power switch

Rear Panel:

• Argon gas inlet
• Vacuum pump power and signal lines
• Main power socket
• Exhaust port

Internal Structure:

• Magnetron target
• Sample stage
• Quartz crystal oscillator film thickness probe (optional)

5. Installation and First-Time Startup Preparation

• Place the equipment on a stable laboratory bench, away from vibration sources.
• Use a three-prong socket with a ground wire, with a grounding resistance ≤100 Ω.
• Connect the argon gas cylinder and set the secondary pressure to 0.03 – 0.05 MPa.
• Check the vacuum pump oil level.
• Conduct an initial vacuum pumping test and observe whether it reaches the 10⁻³ Pa level.

6. Detailed Operation Steps

6.1 Startup and Preparation

• Open the main valve of the argon gas cylinder and set the secondary pressure to 0.04 MPa.
• Connect the main unit power.
• The touch screen lights up, and the main interface is displayed.

6.2 Sample Placement

• Ensure the chamber is vented to atmospheric pressure.
• Lift the glass cylinder cover.
• Secure the sample on the sample stage.
• Adjust the target-sample distance.
• Close the glass cylinder.

6.3 Parameter Setting

• Click “Process” or “Recipe”.
• Set parameters such as target material type, sputtering current, and sputtering time or film thickness.
• Save as a Recipe.

6.4 Starting Coating

• Click “START”.
• The equipment automatically performs the coating process.

6.5 Sample Retrieval and Shutdown

• After coating is complete, the equipment automatically breaks the vacuum.
• Open the glass cylinder and remove the sample.
• Close the glass cylinder, click “Vent” or long-press “STOP”.
• Turn off the power switch and close the main valve of the argon gas cylinder.

7. Recommended Common Recipe Parameters

Application Scenario	Target Material	Current (mA)	Time (s)	Estimated Film Thickness (nm)	Remarks
Conventional SEM	Au	20	60	8 – 12	Economical
High-resolution FE-SEM	Pt or Pt/Pd	25	90	5 – 10	Finest particles
Biological Samples	Au/Pd	15 – 20	120	10 – 15	Low-temperature priority
EDS Energy-Dispersive Spectroscopy Analysis	Carbon evaporation (optional)	–	–	10 – 20	Avoid metal peak interference
Thick or Large Samples	Au	30	180	20 – 30	Requires optional large chamber

8. Target Replacement Steps

• Completely break the vacuum and open the glass cylinder.
• Wear gloves and use an Allen wrench to loosen the target pressure ring.
• Remove the old target material.
• Place the new target material.
• Tighten the pressure ring.
• Close the glass cylinder, pump down the vacuum, and check for leaks.
• Run an empty coating process once.
• Target Lifespan: An Au target can typically be used for approximately 500 – 800 coating sessions.

9. Daily Maintenance and Care

Maintenance Item	Frequency	Method
Cleaning the Sample Chamber Glass Cylinder	After each use	Wipe with a lint-free cloth and isopropyl alcohol or acetone
Checking O-rings	Weekly	Visually inspect and lightly coat with silicone grease
Replacing Vacuum Pump Oil	Every 300 – 500 hours	Drain the oil → Clean the oil tank → Add new oil
Molecular Pump Maintenance	Every 1 – 2 years	Return to the factory or have a professional regenerate it
Cleaning the Target Surface	When replacing the target	Polish the oxide layer with fine sandpaper
Overall Dust Removal	Monthly	Clean with a vacuum cleaner and a soft brush
Checking the Argon Gas Pipeline	Monthly	Check for leaks at the joints

10. Common Troubleshooting

Fault Phenomenon	Possible Causes	Solutions
Failure to Ignite	Insufficient argon pressure / Target oxidation / Excessive vacuum	Check the argon pressure; perform an empty coating to remove oxidation; reduce the vacuum
Unstable or Low Current	Depleted target material / Poor contact	Replace the target material; check the tightness of the pressure ring
Inability to Achieve Vacuum	Insufficient pump oil / Leakage / Aging O-rings	Add pump oil; check for leaks; replace O-rings
Discrepancy Between Coated Film Thickness and Set Value	Dirty film thickness meter probe / Change in target material coating rate	Clean the quartz crystal oscillator; recalibrate the film thickness meter
Unresponsive Touch Screen	Power fluctuations / Software crash	Restart the main unit; contact after-sales service
Sample Overheating or Damage	Excessive current / Prolonged coating time	Reduce the current; perform coating in multiple sessions

11. Optional Accessories Introduction

• Film Thickness Monitoring Unit: Real-time measurement using a quartz crystal oscillator with an accuracy of ±0.1 nm.
• Large Sample Chamber: Sample diameter up to 150 mm and height 30 – 50 mm.
• Carbon Evaporation Attachment: Used for EDS analysis.
• Various Target Materials: Pt, Au/Pd, Pt/Pd, etc.
• Automatic Transformer: Supports a wide voltage range of 115 – 240 V.

12. Precautions and Best Practices

• A new target material must undergo an empty coating process for 20 – 30 seconds during its first use.
• For biological samples, it is recommended to use a Pt target with a low current.
• When the equipment is not in use for an extended period, start it up and pump down the vacuum for 1 hour every week.
• Record the coating parameters and SEM imaging results for each session.
• For the complete official Chinese manual, please contact Hitachi High-Tech China or local agents.