ENI GHW-50 5kW RF Generator – MKS ENI Original, Made in USA
ENI GHW-50 5kW RF Generator – MKS ENI Original, Made in USA - Image 2
ENI GHW-50 5kW RF Generator – MKS ENI Original, Made in USA - Image 3
ENI GHW-50 5kW RF Generator – MKS ENI Original, Made in USA - Image 4
ENI GHW-50 5kW RF Generator – MKS ENI Original, Made in USA - Image 5
ENI GHW-50 5kW RF Generator – MKS ENI Original, Made in USA - Image 6

ENI GHW-50 5kW RF Generator – MKS ENI Original, Made in USA

$10,714.00

The ENI GHW-50 RF Generator, manufactured by MKS ENI (USA), delivers up to 5kW output power at 13.56 MHz. It is widely used in plasma etching, PECVD, PVD coating, and ion cleaning systems in semiconductor and optical industries.
Unit in good physical condition, fully inspected and power tested.

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Description

The ENI GHW-50 is a high-performance RF power generator designed to deliver stable, reliable RF energy for plasma processing systems.
It features precise power regulation, full remote control capability, and water-cooled operation for continuous industrial use.

Condition:
Excellent physical condition, fully tested and operational.
All connectors and controls are intact. Ready for integration into plasma systems.Applications include:

  • Semiconductor plasma etching

  • PECVD & PVD deposition

  • Ion cleaning and surface modification

  • Thin film research and plasma systems

参数项目 说明
Model ENI GHW-50
 Brand ENI / MKS Instruments
Output Power 5 kW（5000 W）
 Frequency 13.56 MHz
AC Input 380–480 V ，21 A，50/60 Hz
 Control （Analog / Serial）
Cooling （Water-cooled）
 Interface Analog I/O、RS232、Matchwork Interface、DC Bias、Interlock
 Dimension 483 × 177 × 560 mm（ 19″ ）
 Weight  60 kg
 Made in USA